The University of Iowa

IMPORTANT: The Optical Science and Technology Center and Microfabrication Facility are being retired after fall 2018 and their services reconfigured under the new Iowa Center for Research, Exploration, and Advanced Technology in Engineering and Sciences (Iowa-CREATES) and Materials Analysis, Testing, and Fabrication (MATFab) in the Iowa Advanced Technology Laboratories (IATL) in spring 2019. As a result, the OSTC/UIMF site will eventually be taken down. Until then, please visit the Iowa-CREATES Website at, or read more about the new center at


Optical Science and
Technology Center

UIMF Nanotechnology Training - Atomic Layer Deposition (ALD)

Tuesday, February 11, 2014

University of Iowa - Microfabrication Facility
Nanotechnology Training

Atomic Layer Deposition (ALD) is a “Nano” technology, allowing thin films of a few nanometers to be deposited in a precisely controlled way.

Atomic Layer Deposition (ALD) is a thin film deposition technique that is based on the sequential, self-limiting surface reaction based on the temporal separation of two or more reactants.

Key Applications: high-k gate oxides, capacitors, solar cells, organic semiconductors, microfluidic, MEMS, Bio MEMS, memristors

Date and venue: Feb. 11, 9:30 am, IATL 104

Training details:

Lecture: 9:30 – 10:45 am
Outline: Intro. to Plasma and Thermal ALD techniques
             Overview of Oxford ALD Instruments
             ALD Processes
             Key Applications

Hands-on Lab: 11:00 – 1 pm (IATL 174)
Instructors: Shawn Xu Ph.D., (Process Engineer, Oxford Instruments America)
                 Aju Jugessur Ph.D., (Director, University of Iowa Microfabrication Facility)

Register here


Individuals with disabilities are encouraged to attend all University of Iowa sponsored events. If you are a person with a disability who requires an accommodation in order to attend this program, please contact the Optical Science & Technology Center in advance at 353-0974 or email