Optical Science and
Technology Center


Check out the latest news and information relating to the Optical Science and Technology Center:

February 11, 2014

University of Iowa - Microfabrication Facility
Nanotechnology Training

Atomic Layer Deposition (ALD) is a “Nano” technology, allowing thin films of a few nanometers to be deposited in a precisely controlled way.

Atomic Layer Deposition (ALD) is a thin film deposition technique that is based on the sequential, self-limiting surface reaction based on the temporal separation of two or more reactants.

Key Applications: high-k gate oxides, capacitors, solar cells, organic semiconductors, microfluidic, MEMS, Bio MEMS, memristors

Date and venue: Feb. 11, 9:30 am, IATL 104

Training details:

Lecture: 9:30 – 10:45 am

January 30, 2014

UIMF highlighted in IowaNow article-

"UI facility studies small structures, supports big projects"

Microfabrication facility offers course on electronic devices

January 21, 2014

UIMF Equipment Spec Sheets are now available on website.

Information may be found at:  http://ostc.uiowa.edu/uimf/equipment

January 21, 2014

New Course: The Art of Molecular Beam Epitaxy (029:225)

Course description:  This course will review the science and technology of molecular beam epitaxy growth with an experimental emphasis.  We will cover such topics as the theory of X-ray diffraction measurements, including symmetric and asymmetric scans, reciprocal space mapping,  calculation of strain and relaxation of a crystal from X-ray measurement, and simulation of X-ray scans; determination of an epilayer critical thickness; measurement techniques and analysis of different types of surface, bulk, and interface defects; determination of true V/III ratios and stoichiometric growth conditions in binary, ternary, and quaternary semiconductors; numerical calculation of bandgaps,...

September 11, 2013

The UIMF took delivery of a state-of-the-art NanoImprint tool, Nanonex 2000 - this tool is a full wafer nanoimprintor that offers all forms of imprint: thermal, photocurable and embossing. It offers excellent uniformity over the entire substrate with high throughput and sub 10 nm resolution. The applications of this tool include, nanophotonics, displays, data storage, advanced materials, biotechnology and nanofluidics. This tool was purchased through an external grant awarded to Prof. McEntaffer to develop X-ray focusing elements for satellites. The installation of this tool is underway.