OSTC

Optical Science and
Technology Center

News

Check out the latest news and information relating to the Optical Science and Technology Center:

September 11, 2013

The UIMF took delivery of a state-of-the-art NanoImprint tool, Nanonex 2000 - this tool is a full wafer nanoimprintor that offers all forms of imprint: thermal, photocurable and embossing. It offers excellent uniformity over the entire substrate with high throughput and sub 10 nm resolution. The applications of this tool include, nanophotonics, displays, data storage, advanced materials, biotechnology and nanofluidics. This tool was purchased through an external grant awarded to Prof. McEntaffer to develop X-ray focusing elements for satellites. The installation of this tool is underway.

August 15, 2013

UIMF users must complete the new EHS course entitled, "GHS Labels and SDS" (W503OS) if you have not already done so.

The OSHA Hazard communication and other chemical regulations were revised by OSHA in 2012. All UIMF users are required to take this new online course since we are expected to comply with this regulatory requirement.

This training module describes the changes to chemical labels and material safety data sheets that will take place due to a revised federal regulation.

 Please find the training course at HR Self service, My training. Send a confirmation pdf copy of your training page to UIMF Director Aju Jugessur by...

July 23, 2013

Another new tool, an Oxford Instrument, RIE-ICP Plasma Pro S100 (Cobra) has been ordered, which will be installed in the cleanroom 174. This tool is capable of high aspect ratio submicron etching using the cryogenic and Bosch processes. Various etch chemistries are possible which include Cl2, BCl3 and SF6 gases.

July 22, 2013

This course covers geometrical and physical optics; interference; diffraction; polarization; microscopic origins of macroscopic optical properties of matter; optical activity; electro-optical, magneto-optical, acousto-optical phenomena; spontaneous Brillioun, Raman, Rayleigh scattering. We will be working our way through the very practical Optics textbook by Hecht. - John P. Prineas, Associate Professor, UI Dept. Physics & Astronomy

July 22, 2013

After several months of careful design and planning, the lab space in IATL 174 culminated into an ISO 5 (Class 100) cleanroom, which is now officially opened to users from May 2013. The renovation work involved the re-routing of ducts, existing building services and the install of services such as compressed air, chilled water and power. This cleanroom houses a wide range of thin-film deposition and etching tools for device fabrication at the micron- and nano-scale. Users are taught the cleanroom operation protocols before accessing the lab. Users can now carry out their fabrication in an ultra clean environment and have less concerns about process or device contamination.

In addition, plans are under way to renovate the adjacent lab, IATL 172 to construct a similar cleanroom...

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